Abstract

Microtransfer printing can be used to fabricate a III-V/Si/SiN structure. This poses stringent requirements on the mode transformers. Rooted in coupled mode theory, we designed and fabricated 174 micrometer long robust Si tapers that are fabrication-tolerant and 750 nm misalignment-tolerant.

Related Research Topics

• IIIV microlasers epitaxially grown on silicon
• Transfer printing technology

Related Projects

• ERC-StG: ELECTRIC (Chip Scale Electrically Powered Optical Frequency Combs )
• ERC-AdG: NARIOS (Nano-Ridge Engineering for Densely Integrated III-V Lasers Directly Grown on Silicon)