| Authors: | W. Xie, R. Gomes, T. Aubert, S. Bisschop, Y. Zhu, Z. Hens, E. Brainis, D. Van Thourhout | | Title: | Nanoscale and Single-Dot Patterning of Colloidal Quantum Dots | | Format: | International Journal | | Publication date: | 10/2015 | | Journal/Conference/Book: | Nano Lett.
| | Editor/Publisher: | American Chemical Society, | | Volume(Issue): | 15(11) p.7481–7487 | | Location: | Washington, DC, United States | | DOI: | 10.1021/acs.nanolett.5b03068 | | Citations: | 53 (Dimensions.ai - last update: 24/11/2024)
44 (OpenCitations - last update: 27/6/2024)
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Abstract
Using an optimized lift-off process we develop a technique for both nanoscale and single-dot
patterning of colloidal quantum dot films, demonstrating feature sizes down to ~30 nm for
uniform films and a yield of 40% for single-dot positioning, in good agreement with a newly
developed theoretical model. While first of all presenting a unique tool for studying physics of
single quantum dots, the process also provides a pathway towards practical quantum dot based
optoelectronic devices. Related Research Topics
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Citations (OpenCitations)
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