Authors: | G. Murdoch, A. Milenin, C. Delveauz, P. Ong, S. Pathak, D. Vermeulen, G. Sterckx, G. Winroth, P. Verheyen, G. Lepage, W. Bogaerts, R. Baets, J. Van Campenhout, P. Absil | Title: | Advanced 300-mm waferscale patterning for silicon photonics devices with record low loss and phase errors | Format: | International Conference Proceedings | Publication date: | 7/2012 | Journal/Conference/Book: | the 17th OpeoElectronics and Communications Conference
| Volume(Issue): | p.15-16 | Location: | Busan, South Korea | Citations: | Look up on Google Scholar
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