Authors:	S. Pathak, M. Vanslembrouck, P. Dumon, D. Van Thourhout, W. Bogaerts
Title:	Effect of mask grid on SOI arrayed waveguide grating performance
Format:	International Conference Proceedings
Publication date:	8/2013
Journal/Conference/Book:	Group IV Photonics
Editor/Publisher:	IEEE,
Volume(Issue):	p.WC7
Location:	Seoul, South Korea
DOI:	10.1109/group4.2013.6644475
Citations:	3 (Dimensions.ai - last update: 24/11/2024) 3 (OpenCitations - last update: 10/5/2024) Look up on Google Scholar
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Abstract

We studied the impact of the lithography mask grid
on the performance of silicon AWGs, and show a dramatic
improvement in crosstalk of 5dB when going from a 5nm to
a 1nm grid.

Related Research Topics

• Silicon Arrayed Waveguide Gratings (AWG)