| Authors: | K. Quang Le, P. Bienstman | | Title: | Enhanced Sensitivity of Absorption-Based Surface Plasmon Interference Sensors in Silicon-On-Insulator by Adsorbed Layer | | Format: | International Conference Proceedings | | Publication date: | 4/2010 | | Journal/Conference/Book: | 15th European Conference on Integrated Optics
| | Location: | United Kingdom | | Citations: | Look up on Google Scholar
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Abstract
We present an numerical investigation of a planar waveguide surface plasmon resonance (SPR) sensor in silicon-on-insulator (SOI) for detecting a change in the imaginary part of the refractive index. By adding a thin adsorbed layer between the metal-analyte boundary it is found that an enhanced sensitivity of the sensor is obtained, suggesting the possibility of realizing a highly integrated and highly sensitive absorption-based SPR sensor in SOI. Related Research Topics
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