| Authors: | S. Scheerlinck, R.H. Pedersen, P. Dumon, W. Bogaerts, U. Plachetka, D. Van Thourhout, R. Baets, A. Kristensen | | Title: | Fabrication of Nanophotonic Circuit Components by Thermal Nano Imprint Lithography | | Format: | International Conference Presentation | | Publication date: | 5/2008 | | Journal/Conference/Book: | CLEO/QELS 2008
| | Volume(Issue): | p.CFO2 | | Location: | San Jose, United States | | DOI: | 10.1109/cleo.2008.4551024 | | Citations: | 3 (Dimensions.ai - last update: 24/11/2024)
1 (OpenCitations - last update: 3/5/2024)
Look up on Google Scholar
| | Download: |
 (398KB) |
Abstract
Nanophotonic components are fabricated using thermal nano imprint lithography (NIL). A silicon-on-insulator Mach-Zehnder interferometer with 20 dB extinction ratio is demonstrated. Grating couplers fabricated by a two-step imprint process demonstrate over 14% coupling efficiency. Related Research Topics
Related Projects
|
|
