Authors:	W. Bogaerts, P. Dumon, D. Van Thourhout, R. Baets
Title:	Low-Loss, Low-Crosstalk Crossings for SOI Nanophotonic Waveguides
Format:	International Journal
Publication date:	10/2007
Journal/Conference/Book:	Optics Letters
Volume(Issue):	32(19) p.2801-2803
DOI:	10.1364/OL.32.002801
Citations:	287 (Dimensions.ai - last update: 24/11/2024) 190 (OpenCitations - last update: 3/5/2024) Look up on Google Scholar
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Abstract

We present compact crossings for silicon-on-insulator photonic wires. The waveguides are broadened using a
3um parabolic taper in each arm. By locally applying a lower index contrast using a double etch technique,
loss of con¯nement is reduced and 97.5% transmission (-1.7dB) is achieved with only -40dB crosstalk.

Related Research Topics

• Silicon (nano)photonic devices fabrication with 193nm and 248nm (DUV) Optical lithography (1999-2012)
• Low-loss Nanophotonic waveguides (1999-2010)

Related Projects

• IST: ePIXnet (European Network of Excellence on Photonic Integrated Components and Circuits)
• IWT: epSOC (electro-photonic System-On-Chip)
• IAP: Photonics@be (Photonics@be)